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      Photomask blanks, which are the base material of photomasks that are light-shielding thin films on a synthetic quartz substrate, are used as the patterning template of circuits to be transferred on a silicon wafer in the semiconductor lithography process.
      Shin-Etsu meets customers’ requests with a wide range of product lines including OMOG (Opaque MoSi on Glass) blanks using MoSi binary as light-shielding film with excellent etching properties instead of conventional Chromium (Cr) binary, and half-tone phase shift photomask blanks.

      Applications

      • Photomasks for integrated circuits
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      For Inquiries About This Product
      • Company:
        Shin-Etsu Chemical Co., Ltd.
      • Department:
        New Functional Materials Div. New Functional Materials Dept. Ⅱ
      • Phone:
        +81-3-3246-5346
      
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